This particular model uses the space charge formula advocated in [2].
Parameters:
 Level:   MOSFET modeling level (default value = 3)
            Level=0: Static injection model
            Level=1: Shichman-Hodges model
            Level=2: Grove-Frohman model
            Level=3: Empirical model
            Level=4: Simplified Grove-Frohman model
 Type:    Type of MOSFET (default value = 1)
            Type = +1:  NMOS
            Type = -1:  PMOS
 Tnom:    Reference temperature (default value = 300.15 K)
 VFB:     Flat band voltage at reference temperature (default value = 0 Volt)
 KP:      Transconductance parameter at reference temperature (default value = 0 Amp/Volt2)
 GAMMA:   Body-effect parameter (default value = Volt0.5)
 PHI:     Surface inversion potential at reference temperature (default value = 0 Volt)
 COX:     Specific capacitance of SiO2 (default value = 0 F/m2)
 NFS:     Surface fast state density (default value = 0 1/m2)
 XJ:      Metallurgical junction depth (default value = 0 m)
 L:       Channel length (default value = 1e-4 m)
 W:       Channel width (default value = 1e-4 m)
 LD:      Lateral diffusion (default value = 0 m)
 XD:      Depletion factor (default value = 0 m/Volt0.5)
 XQC:     Coefficient of channel charge share (default value = 0)
            XQC <= 0.5: Ward-Dutton model of gate capacitance computation
            XQC >  0.5: Meyer model of gate capacitance computation
 DELTA:   Width effect on threshold voltage (default value = 0)
 ETA:     Static feedback on threshold voltage (default value = 1)
 CGD0:    Gate-drain overlap capacitance per meter (default value = 1e-12 F/m)
 EG:      Energy gap for temperature effect on saturation current (default value = 1.11 Volt)
 
References: