This particular model uses the space charge formula advocated in [2].
Parameters: Level: MOSFET modeling level (default value = 3) Level=0: Static injection model Level=1: Shichman-Hodges model Level=2: Grove-Frohman model Level=3: Empirical model Level=4: Simplified Grove-Frohman model Type: Type of MOSFET (default value = 1) Type = +1: NMOS Type = -1: PMOS Tnom: Reference temperature (default value = 300.15 K) VFB: Flat band voltage at reference temperature (default value = 0 Volt) KP: Transconductance parameter at reference temperature (default value = 0 Amp/Volt2) GAMMA: Body-effect parameter (default value = Volt0.5) PHI: Surface inversion potential at reference temperature (default value = 0 Volt) COX: Specific capacitance of SiO2 (default value = 0 F/m2) NFS: Surface fast state density (default value = 0 1/m2) XJ: Metallurgical junction depth (default value = 0 m) L: Channel length (default value = 1e-4 m) W: Channel width (default value = 1e-4 m) LD: Lateral diffusion (default value = 0 m) XD: Depletion factor (default value = 0 m/Volt0.5) XQC: Coefficient of channel charge share (default value = 0) XQC <= 0.5: Ward-Dutton model of gate capacitance computation XQC > 0.5: Meyer model of gate capacitance computation DELTA: Width effect on threshold voltage (default value = 0) ETA: Static feedback on threshold voltage (default value = 1) CGD0: Gate-drain overlap capacitance per meter (default value = 1e-12 F/m) EG: Energy gap for temperature effect on saturation current (default value = 1.11 Volt)
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