This particular model uses the space charge formula advocated in [2].
Parameters:
Level: MOSFET modeling level (default value = 3)
Level=0: Static injection model
Level=1: Shichman-Hodges model
Level=2: Grove-Frohman model
Level=3: Empirical model
Level=4: Simplified Grove-Frohman model
Type: Type of MOSFET (default value = 1)
Type = +1: NMOS
Type = -1: PMOS
Tnom: Reference temperature (default value = 300.15 K)
VFB: Flat band voltage at reference temperature (default value = 0 Volt)
KP: Transconductance parameter at reference temperature (default value = 0 Amp/Volt2)
GAMMA: Body-effect parameter (default value = Volt0.5)
PHI: Surface inversion potential at reference temperature (default value = 0 Volt)
COX: Specific capacitance of SiO2 (default value = 0 F/m2)
NFS: Surface fast state density (default value = 0 1/m2)
XJ: Metallurgical junction depth (default value = 0 m)
L: Channel length (default value = 1e-4 m)
W: Channel width (default value = 1e-4 m)
LD: Lateral diffusion (default value = 0 m)
XD: Depletion factor (default value = 0 m/Volt0.5)
XQC: Coefficient of channel charge share (default value = 0)
XQC <= 0.5: Ward-Dutton model of gate capacitance computation
XQC > 0.5: Meyer model of gate capacitance computation
DELTA: Width effect on threshold voltage (default value = 0)
ETA: Static feedback on threshold voltage (default value = 1)
CGS0: Gate-source overlap capacitance per meter (default value = 1e-12 F/m)
EG: Energy gap for temperature effect on saturation current (default value = 1.11 Volt)
References: